Expansion of Silvaco’s Victory TCAD and Digital Twin Modeling Platform to Cover Planar CMOS, FinFET, and Advanced CMOS Technologies

SANTA CLARA, Calif., Sept. 24, 2024 (GLOBE NEWSWIRE) — Silvaco Group, Inc. (Nasdaq: SVCO, “Silvaco” or the “Company”), a provider of TCAD, EDA software, and SIP solutions that enable semiconductor design and digital twin modeling through AI software and innovation, today announced that its 2024 TCAD Baseline Release simulation platform with digital twin modeling, provides support for planar CMOS, FinFET and Gate-All-Around (GAA) transistor technologies, enabling semiconductor companies to accelerate technology development.

Silvaco’s latest TCAD technology platform enables advanced CMOS Process and Device simulation to support the development of next-generation semiconductor devices. This platform boosts performance, yield, and efficiency across the evolving semiconductor design and manufacturing landscape. The solution enables highly accurate 3D process simulation, using digital twin-like precision and integrates stress simulation to model deformed structures. Additionally, the platform supports cryogenic applications through an atomistic quantum transport approach, enabling straightforward modeling of transistor structures down to 1 Kelvin.

“Our TCAD platform has gained significant traction in the Display, Photonics, Memory, and Power Semiconductor markets, where our solutions have been instrumental in driving innovation and enhancing performance,”said Dr. Babak Taheri, Chief Executive Officer, Silvaco. “We have now extended our comprehensive suite of tools to the advanced CMOS market, enabling next-generation advancements in technologies to address growing markets such as foundries, 5G, AI, and high-performance computing. Our newly released TCAD platform has been utilized by a strategic customer for the past few years and is now available for broad market adoption. This new capability for advanced CMOS technology enables customers to accelerate their technology development with significant cost savings.”

“Nanotechnology, like GAA, exhibits advanced quantum physical effects,” said Tillmann Kubis, Associate Professor in the Elmore Family School of Electrical and Computer Engineering at Purdue University. “Over the past six years, our team of scientists has collaborated with Silvaco to enable the simulation of full devices, such as nanowires and GAAs, powered by NEMO5, which is an NEGF-based atomistic quantum transport simulation tool developed at Purdue and licensed by Silvaco. This collaboration is now enabling Silvaco’s TCAD simulation performance with atomistic accuracy.”

“This latest release of our TCAD platform is the culmination of years of intensive development, refinement, and industry collaboration in order to meet the demanding needs of designing in advanced CMOS process technologies,” said Eric Guichard, Senior VP and General Manager TCAD Business Unit, Silvaco. “The latest release of our TCAD platform now incorporates digital twin modeling for CMOS technologies, as well as atomistic simulation technologies to provide a highly competitive and attractive alternative solution for semiconductor companies designing in advanced Planar CMOS, FinFET, and emerging GAA process technologies.”

In conclusion, Silvaco’s TCAD Baseline Release offers semiconductor companies a cutting-edge simulation platform that supports various transistor technologies, enabling them to accelerate technology development and innovation in the rapidly evolving semiconductor industry. With its advanced CMOS process and device simulation capabilities, integration of digital twin modeling, and support for cryogenic applications, Silvaco is paving the way for next-generation advancements in semiconductor design. Collaborations with leading institutions like Purdue University further enhance the accuracy and performance of Silvaco’s TCAD simulations, ensuring that customers can design with confidence and efficiency.

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